JPH0351740Y2 - - Google Patents
Info
- Publication number
- JPH0351740Y2 JPH0351740Y2 JP6368784U JP6368784U JPH0351740Y2 JP H0351740 Y2 JPH0351740 Y2 JP H0351740Y2 JP 6368784 U JP6368784 U JP 6368784U JP 6368784 U JP6368784 U JP 6368784U JP H0351740 Y2 JPH0351740 Y2 JP H0351740Y2
- Authority
- JP
- Japan
- Prior art keywords
- silicon substrate
- electrode
- electrode film
- film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 39
- 229910052710 silicon Inorganic materials 0.000 claims description 33
- 239000010703 silicon Substances 0.000 claims description 33
- 238000001514 detection method Methods 0.000 claims description 19
- 239000000126 substance Substances 0.000 claims description 15
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 32
- 239000004020 conductor Substances 0.000 description 10
- 239000012528 membrane Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 239000000919 ceramic Substances 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 6
- 229910000510 noble metal Inorganic materials 0.000 description 5
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 4
- 239000008151 electrolyte solution Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 235000011164 potassium chloride Nutrition 0.000 description 2
- 239000001103 potassium chloride Substances 0.000 description 2
- 239000010970 precious metal Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 235000013334 alcoholic beverage Nutrition 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000001017 electron-beam sputter deposition Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000000855 fermentation Methods 0.000 description 1
- 230000004151 fermentation Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Landscapes
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
- Wire Bonding (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6368784U JPS60174856U (ja) | 1984-04-27 | 1984-04-27 | ポ−ラロセンサ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6368784U JPS60174856U (ja) | 1984-04-27 | 1984-04-27 | ポ−ラロセンサ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60174856U JPS60174856U (ja) | 1985-11-19 |
| JPH0351740Y2 true JPH0351740Y2 (en]) | 1991-11-07 |
Family
ID=30594070
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6368784U Granted JPS60174856U (ja) | 1984-04-27 | 1984-04-27 | ポ−ラロセンサ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60174856U (en]) |
-
1984
- 1984-04-27 JP JP6368784U patent/JPS60174856U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60174856U (ja) | 1985-11-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4203087A (en) | Absolute humidity sensors and methods of manufacturing humidity sensors | |
| US4277742A (en) | Absolute humidity sensors and methods of manufacturing humidity sensors | |
| CN106959169B (zh) | 一种新型多功能传感器芯片及其制备方法 | |
| JPH1062383A (ja) | 電気化学センサ | |
| CN107064255B (zh) | 一种基于CMOS工艺的复合电极式pH传感器及其制备方法 | |
| US20040035699A1 (en) | Method and fabrication of the potentiometric chemical sensor and biosensor based on an uninsulated solid material | |
| US6613205B1 (en) | Electrochemical sensor | |
| JPH0351740Y2 (en]) | ||
| JPS5949542B2 (ja) | 流体中の特定物質の濃度を測定するためのセンサ | |
| JPH0765985B2 (ja) | ＩＳＦＥＴ並びにこれを利用したＩＳＦＥＴプローブとＩＳＦＥＴ ｐＨセンサ | |
| JPH09257736A (ja) | ガスセンサおよびガス検出装置 | |
| JPH03167463A (ja) | 感湿素子 | |
| JP2810779B2 (ja) | 容量式薄膜湿度センサおよびその製造方法 | |
| JPS6312252B2 (en]) | ||
| CN114594150B (zh) | 一种固态隔膜及其制备方法和设有其的气体传感器 | |
| JP2501856B2 (ja) | 電気化学式センサ | |
| JPH0320768Y2 (en]) | ||
| JPS59225344A (ja) | イオンセンサ−用絶縁ゲ−ト電界効果トランジスタ | |
| JPS6073448A (ja) | 雰囲気センサ | |
| JPS6340847A (ja) | ガス検知方法 | |
| JPH02249962A (ja) | Ｆｅｔセンサ | |
| JP3035368B2 (ja) | ガスセンサの製造方式 | |
| JPH04223256A (ja) | 酵素センサおよびその製造方法 | |
| JPS5848840A (ja) | 電気抵抗式湿度センサ及びその製造方法 | |
| JP2607631B2 (ja) | 電気化学式センサ |